Product Table
| Property | Specification |
|---|---|
| Material | Yttrium (Y) |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.250” |
| Form | Sputtering Target |
Description
Yttrium (Y) sputtering targets are high-purity materials used to deposit thin films on various substrates. Sputtering technology provides repeatable, precise, and controllable film deposition. The process can be scaled from small R&D batches to medium or large production, with chemical reactions occurring on the target, in-flight, or on the substrate depending on process parameters.
Applications
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Thin-film deposition on substrates such as silicon wafers
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Semiconductor sputter etching requiring high anisotropy without selectivity issues
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Material analysis (e.g., SIMS) to detect extremely low impurity concentrations
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Space research, simulating space weathering on airless bodies like asteroids and the Moon.
