Product Table
| Property | Specification |
|---|---|
| Material | Yttrium (Y) |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
| Form | Sputtering Target |
Description
Yttrium (Y) sputtering targets are high-purity materials designed for thin-film deposition. Sputtering allows precise and controllable deposition, scalable from small R&D batches to medium or large production runs. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters, offering high flexibility and control over film growth and microstructure.
Applications
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Thin-film deposition on substrates, including silicon wafers
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Semiconductor sputter etching with high anisotropy requirements
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Material analysis (e.g., SIMS) to detect very low impurity concentrations
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Space research, simulating space weathering on airless bodies like asteroids and the Moon.
