Product Table
| Property | Specification |
|---|---|
| Material | Yttrium (Y) |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Form | Sputtering Target |
Description
Yttrium (Y) sputtering targets are high-purity materials used for thin-film deposition on diverse substrates. Sputtering ensures precise and repeatable film growth, scalable from small R&D batches to larger production volumes. Reactions may occur on the target surface, in-flight, or on the substrate, giving control over film properties and microstructure.
Applications
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Thin-film deposition on substrates, including silicon wafers
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Semiconductor sputter etching with high anisotropy requirements
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Material analysis (e.g., SIMS) for detecting extremely low impurity concentrations
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Space applications simulating space weathering on airless bodies such as asteroids and the Moon
