Product Table
| Property | Specification |
|---|---|
| Material | Yttrium Ferrite (Y₃Fe₅O₁₂) |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.250” |
| Form | Sputtering Target |
Description
Yttrium Ferrite (Y₃Fe₅O₁₂) sputtering targets are widely used for high-quality thin film deposition. The sputtering process is reliable, repeatable, and suitable for both laboratory research and scaled-up production. Film growth conditions can be precisely controlled by adjusting process parameters, allowing optimization of microstructure and material properties.
Applications
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Thin-film deposition on substrates such as silicon wafers
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Semiconductor sputter etching for high anisotropy etching
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Material analysis via SIMS, enabling detection of trace impurities
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Space-related research, as sputtering plays a role in space weathering on bodies like asteroids and the Moon.
