| Category | Details |
|---|---|
| Product Name | Praseodymium Calcium Manganate (Pr₀.₇Ca₀.₃MnO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.125” |
| Description | Sputtering is a proven technology for depositing thin films from various materials onto diverse substrates. It is repeatable, scalable, and allows precise control over growth and microstructure. |
Applications
| Application Area | Details |
|---|---|
| Thin Film Deposition | Deposits thin films by eroding material from the target onto substrates such as silicon wafers. |
| Semiconductor Etching | Used in sputter etching when high etching anisotropy is required and selectivity is not critical. |
| Material Analysis (SIMS) | The target is sputtered at a constant rate; mass spectrometry measures the concentration and identity of atoms, detecting even trace impurities. |
| Space / Space Weathering | Used to study physical and chemical changes on airless bodies such as the Moon and asteroids. |
