| Category | Details |
|---|---|
| Product Name | Praseodymium Calcium Manganate (Pr₀.₇Ca₀.₃MnO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Sputtering deposits thin films from various materials onto diverse substrates. The process is repeatable, scalable, and allows precise control over film growth and microstructure. |
Applications
| Application Area | Details |
|---|---|
| Thin Film Deposition | Deposits thin films by eroding material from the target onto substrates such as silicon wafers. |
| Semiconductor Etching | Used in sputter etching when high etching anisotropy is needed and selectivity is less critical. |
| Material Analysis (SIMS) | Target is sputtered at a constant rate for mass spectrometry to determine composition and detect trace impurities. |
| Space / Space Weathering | Helps study physical and chemical changes on airless bodies like the Moon and asteroids. |
