Lanthanum Titanate (LaTiO₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.250” |
| Description | Sputtering is a proven thin-film deposition technology used to coat diverse substrate shapes and sizes. The process is repeatable, scalable from R&D to production, and offers parameter control over film growth and microstructure. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process conditions. |
| Key Features | • Suitable for a wide range of thin-film applications • High control over film microstructure • Adaptable for R&D, medium, and large-scale manufacturing |
| Applications | • Thin-film deposition on substrates such as silicon wafers • Semiconductor sputtering for anisotropic etching • Analytical applications like SIMS (Secondary Ion Mass Spectrometry) • Material composition and impurity detection • Space weathering studies on asteroids, the Moon, and other airless bodies. |
