Lanthanum Titanate (LaTiO₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.125” |
| Description | Sputtering is a proven thin-film deposition technology used for coating various substrate shapes and sizes. The process is repeatable, scalable from small R&D to large-area production, and allows high control over film growth, microstructure, and chemical reactions occurring on the target surface, in-flight, or on the substrate. |
| Key Features | • Repeatable and scalable deposition process • Supports a wide range of materials and substrates • Allows precise control over film microstructure |
| Applications | • Thin-film deposition by sputtering onto substrates like silicon wafers • Semiconductor sputtering for anisotropic etching • Analytical sputtering for material composition studies (e.g., SIMS) • Detection of trace impurities via sputtered atom analysis • Space weathering studies on asteroids, lunar surfaces, and other airless bodies. |
