Lanthanum Titanate (LaTiO₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable thin-film deposition technique suitable for diverse substrate shapes and sizes. The process is repeatable, scalable from R&D to large-area production, and allows control over chemical reactions on the target surface, in-flight, or on the substrate. |
| Key Features | • High repeatability and scalability • Suitable for various materials and substrate shapes • Precise control over film growth and microstructure |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor sputtering and anisotropic etching • Analytical sputtering for material composition (e.g., SIMS) • Detection of trace impurities via mass spectrometry • Study of space weathering on airless bodies such as asteroids and the Moon. |
