Lanthanum Titanate (LaTiO₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering is a proven thin-film deposition method suitable for diverse substrate shapes and sizes. The process is repeatable, scalable, and allows precise control over chemical reactions and microstructure. |
| Key Features | • Repeatable and scalable process • Suitable for small R&D to large-area production • Control over target, in-flight, and substrate reactions |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor sputtering and etching (high anisotropy) • Analytical sputtering (SIMS) for material composition • Detection of trace impurities • Space weathering studies on airless bodies (asteroids, Moon). |
