Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target (2” × 0.125”) in table format:
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Sputtering is a reliable technology for depositing thin films from diverse materials onto various substrate shapes and sizes. The process is repeatable, scalable from small R&D to medium-large production, and allows precise control over growth and microstructure. |
| Key Features | • Repeatable and scalable deposition • High control over film growth and microstructure • Compatible with various substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor target etching with high anisotropy • Analytical sputtering (SIMS) for composition and impurity analysis • Space applications, including simulation of space weathering on airless bodies such as asteroids and the Moon. |
