Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target (1” × 0.250”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable method to deposit thin films from a wide variety of materials onto diverse substrate shapes and sizes. The process is repeatable, scalable from R&D to medium-large production batches, and allows precise control over growth and microstructure. |
| Key Features | • Repeatable and scalable deposition • Precise control of film growth and microstructure • Suitable for various substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor target etching with high anisotropy • Analytical sputtering (SIMS) for determining composition and impurities • Space applications, simulating space weathering on airless bodies such as asteroids and the Moon. |
