Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target (4” × 0.125”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.125” |
| Description | Sputtering is a proven technology for depositing thin films from diverse materials onto substrates of various shapes. The process is repeatable, scalable from small R&D to medium/large production, and allows precise control over film growth and microstructure. |
| Key Features | • Scalable from R&D to production • Precise microstructure control • Compatible with diverse substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates such as silicon wafers • Semiconductor target etching requiring high anisotropy • Analytical sputtering (SIMS) for composition and impurity detection • Space applications simulating space weathering on airless bodies such as asteroids and the Moon. |
