Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target (2” × 0.250”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable method for depositing thin films from diverse materials onto various substrate shapes. The process is repeatable, scalable from R&D to medium/large production, and allows precise control over film growth and microstructure. |
| Key Features | • Scalable from small research to production batches • Precise control over microstructure and film growth • Compatible with diverse substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates such as silicon wafers • Semiconductor target etching with high anisotropy • Analytical sputtering (SIMS) for detecting composition and impurities • Space applications simulating space weathering on airless bodies like asteroids and the Moon. |
