Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target (2” × 0.125”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Sputtering is a reliable technique for depositing thin films from a variety of materials onto diverse substrate shapes. The process is repeatable and scalable from research to medium/large production batches, with precise control over growth and microstructure. |
| Key Features | • Scalable from R&D to production • Precise control of microstructure and film growth • Compatible with diverse substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates such as silicon wafers • Semiconductor target etching with high anisotropy • Analytical sputtering (SIMS) for determining material composition and detecting trace impurities • Space applications, simulating space weathering on airless bodies like asteroids and the Moon. |
