Lanthanum Nickel Oxide (LaNiO₃) Sputtering Target (8” × 0.250”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Nickel Oxide (LaNiO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 8” |
| Thickness | 0.250” |
| Description | High-quality LaNiO₃ sputtering target for depositing thin films on various substrate shapes. LaNiO₃ is a metallic perovskite oxide with excellent thermal and chemical stability. The sputtering process allows precise control over film growth and microstructure for both research and production-scale applications. |
| Key Features | • Extended oxygen-deficient compositions • Intrinsic n-type metallic conductivity • Perovskite crystal structure • Thermal and chemical stability • Suitable for advanced electronic and thin-film applications |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor target etching • Analytical sputtering (SIMS) for material composition and trace impurity detection • Space applications simulating space weathering • Ferroelectric thin-film capacitors • Solid oxide fuel cells (SOFCs) • Nonvolatile ferroelectric RAM • Multilayer actuators • Oxygen and ethanol sensing layers • Catalyst precursors for organic synthesis and controlled carbon nanotube growth |
| Deposition Methods | • Sputtering (physical method) • Pulsed laser deposition • Mist plasma evaporation • Chemical vapor deposition • Metallo-organic chemical vapor deposition • Chemical solution deposition (wet chemical method). |
