Technical Specifications
| Property | Value |
|---|---|
| Product Name | Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.250” |
| Chemical Formula | LaNiO3 |
| Material Type | Perovskite-type oxide |
| Conductivity | Metallic |
| Structure | Perovskite crystal |
| Stability | Thermal and chemical stability |
| Applications | Thin film deposition, semiconductor etching, SIMS analysis, space weathering |
| Advanced Applications | Ferroelectric thin film capacitors, solid oxide fuel cells, nonvolatile ferroelectric RAM, multilayer actuators, oxygen pressure and ethanol sensing layers, catalyst precursors, controlled carbon nanotube growth |
| Deposition Methods | Sputtering, pulsed laser deposition, mist plasma evaporation, chemical vapor deposition, metallo-organic chemical vapor deposition, chemical solution deposition. |
