Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
Product Specifications
| Property | Value |
|---|---|
| Product | Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.125” |
Overview
Sputtering is a reliable technique used to deposit thin films from a wide range of materials onto various substrate shapes and sizes. The sputtering process is repeatable and can be scaled from small research and development applications to production batches involving medium to large substrate areas. Depending on process parameters, chemical reactions may occur on the target surface, during transport, or on the substrate. Although sputter deposition is complex due to numerous variables, these same variables provide experts with extensive control over film growth and microstructure.
Applications of Sputtering Targets
Sputtering targets are used for thin-film deposition. This method deposits material by sputtering, where the target source is eroded and transferred onto a substrate such as a silicon wafer. Semiconductor sputtering targets are also used for etching, particularly in situations requiring high etching anisotropy where selectivity is not a primary concern. Additionally, sputtering targets support analytical applications by enabling material removal from the target surface.
A key example is secondary ion mass spectrometry (SIMS), where the target is continuously sputtered while the composition and identity of ejected atoms are measured through mass spectrometry. This allows determination of material composition and detection of extremely low impurity concentrations.
Sputtering also plays a role in space environments. It is one of the mechanisms of space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Material Description
Lanthanum nickel oxide (LaNiO3) is a significant perovskite-type oxide known for its metallic conductivity. It is a ternary compound with distinctive physical and chemical features, including a broad range of oxygen-deficient compositions, intrinsic n-type metallic conductance, a perovskite crystal structure, and high thermal and chemical stability. These attributes make LaNiO3 a valuable perovskite oxide electrode for applications such as ferroelectric thin-film capacitors, solid oxide fuel cells, nonvolatile ferroelectric random-access memories, and multilayer actuators.
LaNiO3 films also show potential as sensing layers for oxygen pressure and ethanol detection. Reduced La–Ni mixed oxides serve as effective catalyst precursors for synthesizing organic compounds and producing controlled-diameter carbon nanotubes.
Both chemical and physical thin-film deposition techniques are used to fabricate LaNiO3 films. Chemical approaches include chemical vapor deposition, metallo-organic chemical vapor deposition, and chemical solution deposition. Physical methods include sputtering, pulsed laser deposition, and mist plasma evaporation. Wet chemical solution deposition techniques offer a simple and versatile alternative for thin-film preparation.
