Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
Product Specifications
| Property | Value |
|---|---|
| Product | Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.250” |
Overview
Sputtering is a well-established technique for depositing thin films from a wide range of materials onto diverse substrate shapes and sizes. The process using sputtering targets is repeatable and can be scaled from small research projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, during transport, or on the substrate depending on process parameters. While sputter deposition is complex due to multiple variables, it offers experts extensive control over film growth and microstructure.
Applications of Sputtering Targets
Sputtering targets are used for thin-film deposition. This process involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer. Semiconductor sputtering targets are also employed for etching, especially when high etching anisotropy is required and selectivity is not a concern. Sputtering targets are further used in analytical applications to remove target material.
A key example is secondary ion mass spectrometry (SIMS), where the target sample is sputtered at a constant rate. As material is removed, the concentration and identity of sputtered atoms are measured via mass spectrometry. This allows accurate determination of the target material composition and detection of trace impurities.
Sputtering also has applications in space. It contributes to space weathering, a process that alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Material Description
Lanthanum nickel oxide (LaNiO3) is an important perovskite-type oxide with metallic conductivity. It is a ternary compound with unique chemical and physical properties, including a broad range of oxygen-deficient compositions, intrinsic n-type metallic conductance, a perovskite crystal structure, and thermal and chemical stability. These properties make LaNiO3 a critical perovskite oxide electrode in applications such as ferroelectric thin-film capacitors, solid oxide fuel cells, nonvolatile ferroelectric random-access memories, and multilayer actuators.
LaNiO3 films also show potential as sensing layers for oxygen pressure and ethanol. Reduced La–Ni mixed oxides are reported to serve as effective catalyst precursors for synthesizing organic compounds and producing carbon nanotubes with controlled diameters.
Both chemical and physical thin-film deposition methods are used to prepare LaNiO3 on various substrates. Chemical approaches include chemical vapor deposition, metallo-organic chemical vapor deposition, and chemical solution deposition. Physical methods include sputtering, pulsed laser deposition, and mist plasma evaporation. Wet chemical solution deposition techniques provide a simple and versatile alternative for thin-film fabrication.
