Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
Product Specifications
| Property | Value |
|---|---|
| Product | Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
Overview
Sputtering is a well-established technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes. The process using sputtering targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, during transport, or on the substrate depending on process parameters. While sputter deposition involves many variables, these parameters give experts a high degree of control over film growth and microstructure.
Applications of Sputtering Targets
Sputtering targets are used for thin-film deposition. This process involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer. Semiconductor sputtering targets are also used for etching, especially when a high degree of etching anisotropy is required and selectivity is not a concern. Sputtering targets are additionally employed for analytical applications, removing target material.
A prime example is secondary ion mass spectrometry (SIMS), where the target is sputtered at a constant rate. As material is removed, the concentration and identity of sputtered atoms are measured using mass spectrometry. This allows determination of target composition and detection of extremely low concentrations of impurities.
Sputtering also has applications in space. It is one of the mechanisms of space weathering, a process that alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Material Description
Lanthanum nickel oxide (LaNiO3) is an important perovskite-type oxide with metallic conductivity. It is a ternary compound with distinctive chemical and physical properties, including a broad range of oxygen-deficient compositions, intrinsic n-type metallic conductance, a perovskite crystal structure, and thermal and chemical stability. These characteristics make LaNiO3 a technologically important perovskite oxide electrode for applications such as ferroelectric thin-film capacitors, solid oxide fuel cells, nonvolatile ferroelectric random-access memories, and multilayer actuators.
LaNiO3 films also have potential as active sensing layers for oxygen pressure and ethanol. Reduced La–Ni mixed oxides are reported to be effective catalyst precursors for synthesizing organic compounds and producing carbon nanotubes with controlled diameters.
Various chemical and physical thin-film deposition techniques are used to prepare LaNiO3 on different substrates. Chemical methods include chemical vapor deposition, metallo-organic chemical vapor deposition, and chemical solution deposition. Physical methods include sputtering, pulsed laser deposition, and mist plasma evaporation. Wet chemical solution deposition techniques provide a simple and versatile alternative for thin-film fabrication.
