Cerium Oxide (CeO2) Sputtering Targets, 8” × 0.250”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO2) Sputtering Targets |
| Purity | 99.99% |
| Size | 8” |
| Thickness | 0.250” |
| Description | Sputtering is a proven technology for depositing thin films from diverse materials onto various substrate shapes. It is repeatable, scalable from small R&D to medium/large substrate production, and allows precise control over growth and microstructure. Chemical reactions can occur on the target, in-flight, or on the substrate depending on process parameters. |
| Applications | – Film deposition on substrates (e.g., silicon wafers) – Semiconductor etching for high anisotropy – Material analysis via SIMS – Space applications (space weathering on asteroids, Moon) |
| Material Info | Cerium, a lanthanide and the most abundant rare-earth element in Earth’s crust, forms CeO2. Cerium oxide is used in optical and electronic applications due to high refractive index and dielectric constant. It also serves as corrosion-protective coating, polishing material, automotive catalyst, gas sensor, electrolyte material, oxygen storage, oxide fuel cell component, and in microelectronics, optical, electro-optical, and optoelectronic devices. |
