Cerium Oxide (CeO2) Sputtering Targets, 6” × 0.250”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO2) Sputtering Targets |
| Purity | 99.99% |
| Size | 6” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable thin-film deposition method suitable for diverse substrate shapes. It is repeatable, scalable from R&D to medium/large production, and provides precise control over film growth and microstructure. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters. |
| Applications of Sputtering Targets | – Thin-film deposition onto substrates such as silicon wafers – Semiconductor sputter etching where high anisotropy is required – Analytical applications including SIMS for impurity detection – Space weathering research involving asteroids and the Moon |
| Material Information (Cerium Oxide) | Cerium, the most abundant lanthanide, forms CeO₂, valued for its high refractive index and dielectric constant. CeO₂ is used in corrosion-resistant coatings, polishing materials, automotive catalysts, gas sensors, oxygen storage materials, fuel cells, microelectronics, and optical/electro-optical devices due to its moderate band gap, high refractive index, and dielectric properties. |
