Cerium Oxide (CeO₂) Sputtering Targets, 5” × 0.250”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO₂) Sputtering Targets |
| Purity | 99.99% |
| Size | 5” |
| Thickness | 0.250” |
| Description | Sputtering enables precise thin-film deposition on diverse substrate shapes. It is repeatable, scalable from R&D to medium/large production, and provides extensive control over film growth and microstructure. Reactions may occur on the target, during particle flight, or on the substrate depending on process settings. |
| Applications of Sputtering Targets | – Thin-film deposition by sputtering onto substrates such as silicon wafers – Semiconductor sputter-etching for high anisotropy applications – Analytical etching, including SIMS for impurity detection – Space-weathering simulation for airless bodies like asteroids and the Moon |
| Material Information (Cerium Oxide) | Cerium, the most abundant lanthanide, forms CeO₂ with a high refractive index and strong dielectric properties. It is used in corrosion-resistant coatings, polishing compounds, automotive catalysts, gas sensors, solid oxide fuel cells, oxygen-storage materials, microelectronics, and optical/optoelectronic devices due to its moderate band gap and dielectric strength. |
