Cerium Oxide (CeO₂) Sputtering Targets, 5” × 0.125”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO₂) Sputtering Targets |
| Purity | 99.99% |
| Size | 5” |
| Thickness | 0.125” |
| Description | Sputtering provides precise thin-film deposition on various substrate shapes and sizes. The process is repeatable, scalable from R&D to medium/large-area production, and offers strong control over film microstructure. Reactions may occur on the target surface, during particle flight, or on the substrate depending on parameters. |
| Applications of Sputtering Targets | – Thin-film deposition by sputtering onto substrates such as silicon wafers – Semiconductor sputter-etching requiring high anisotropy – Analytical etching for techniques like SIMS to detect impurities – Space-related studies of weathering on airless bodies (Moon, asteroids) |
| Material Information (Cerium Oxide) | Cerium oxide, derived from the most abundant lanthanide, has a high refractive index and strong dielectric properties. It is used in corrosion-resistant coatings, polishing materials, automotive catalysts, gas sensors, electrolyte materials, oxygen-storage systems, oxide fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices due to its moderate band gap and stability. |
