Cerium Oxide (CeO2) Sputtering Targets, indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”

$1,138.73

Size

Property	Specification
Product Name	Cerium Oxide (CeO2) Sputtering Targets, indium
Purity	99.99%
Size	1”
Thickness	0.125”
Description	Sputtering is a proven technology for depositing thin films from various materials onto diverse substrate shapes. It is repeatable, scalable from small R&D to medium/large substrate production, and allows precise control over growth and microstructure. Chemical reactions can occur on the target, in-flight, or on the substrate depending on process parameters.
Applications	– Film deposition onto substrates (e.g., silicon wafers) – Semiconductor etching for high anisotropy – Material analysis via SIMS – Space applications (space weathering on asteroids, Moon)
Material Info	Cerium is a lanthanide and the most abundant rare-earth element in Earth’s crust. Cerium oxide is useful for optical/electronic applications due to high refractive index and dielectric constant. It is corrosion resistant and widely used in polishing, automotive catalysts, gas sensors, electrolytes, oxygen storage, oxide fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices.