Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Specifications
| Property | Value |
|---|---|
| Purity | 99.9% |
| Size | 5” |
| Thickness | 0.250” |
Sputtering is a proven technology capable of depositing thin films from a wide range of materials onto various substrate shapes and sizes.
The process using sputter targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, during transport, or on the substrate depending on the process parameters.
These numerous parameters make sputter deposition a complex process, yet they provide experts with extensive control over film growth and microstructure.
Applications of Sputtering Targets
Sputtering targets are used for film deposition. Deposition using sputter targets is a method of creating thin films by sputtering, which involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer.
Semiconductor sputtering targets are also used for etching. Sputter etching is selected when a high degree of etching anisotropy is needed and selectivity is not critical.
Sputter targets are additionally used for analytical applications by etching away the target material. One example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As sputtering progresses, the concentration and identity of sputtered atoms are measured using mass spectrometry. With the aid of the sputtering target, the composition of the target material can be determined, and even extremely low impurity concentrations can be detected.
Sputtering also has applications in space. It is one of the processes contributing to space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Lead Zirconium Titanate Information
Lead zirconium titanate is an inorganic compound and a ceramic perovskite material that exhibits a strong piezoelectric effect, meaning the material changes shape when an electric field is applied. It is used in numerous practical applications, including ultrasonic transducers and piezoelectric resonators.
Preparation of PZT Thin Films
The preparation of PZT thin films has been explored using various techniques such as sol–gel processing, pulsed laser deposition, radio frequency (RF) magnetron sputtering, and metal organic chemical vapor deposition (MOCVD). These techniques may influence the electrical and structural properties of the resulting thin films.
Among them, RF magnetron sputtering is considered a reliable method due to its ability to produce thin films with uniformity and smooth surface quality.
