Antimony (Sb) Sputtering Targets
Purity: 99.999% | Size: 3” | Thickness: 0.250”
Antimony sputtering targets are designed for precise thin-film deposition on a variety of substrate shapes and sizes. The sputtering process is reliable and scalable, supporting both research and large-scale production. Reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, offering precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for trace impurity detection.
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Space applications: contributes to space weathering on airless bodies like asteroids and the Moon.
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Fire-retardant coatings.
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Optoelectronic devices: LEDs, laser diodes, photodiodes, and solar cells.
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Transparent conductive films using antimony alloys (e.g., indium-antimony oxide).
About Antimony (Sb):
Antimony (atomic number 51) is a bluish-white metalloid in Group 15, with chemical properties similar to arsenic. It is used as a dopant in n-type silicon wafers for diodes, infrared detectors, and Hall-effect devices. Antimony forms alloys with elements like tin and indium, enabling applications in transparent conductive films, flexible coatings, and optoelectronic devices.
