Antimony (Sb) Sputtering Targets with Indium
Purity: 99.999% | Size: 2” | Thickness: 0.125”
Antimony sputtering targets alloyed with indium are engineered for precise thin-film deposition across diverse substrate shapes and sizes. The sputtering process is reliable and scalable, supporting both small research projects and medium-to-large production batches. Reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, providing experts with precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for trace impurity detection.
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Space applications: sputtering contributes to space weathering on airless bodies like asteroids and the Moon.
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Fire-retardant coatings.
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Optoelectronic devices: LEDs, laser diodes, photodiodes, and solar cells.
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Transparent conductive films using indium-antimony compounds.
About Antimony (Sb):
Antimony (atomic number 51) is a bluish-white metalloid in Group 15, with chemical properties similar to arsenic. It is increasingly used in semiconductors as a dopant for n-type silicon wafers, infrared detectors, diodes, and Hall-effect devices. When combined with elements like indium, antimony forms alloys suitable for specialized sputtering applications, including transparent conductive films and coatings for optoelectronic and flexible materials.
