Antimony Telluride (Sb₂Te₃) Sputtering Targets
Purity: 99.999% | Size: 1” | Thickness: 0.125”
Antimony telluride sputtering targets enable precise thin-film deposition on a variety of substrate shapes and sizes. The process is repeatable and scalable, suitable for both small R&D projects and medium-to-large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, providing precise control over film growth and microstructure.
Applications:
-
Thin-film deposition on substrates such as silicon wafers.
-
Semiconductor etching requiring high anisotropy.
-
Material analysis (e.g., SIMS) for trace impurity detection.
-
Space applications, including surface modification of airless bodies like asteroids and the Moon.
About Antimony Telluride (Sb₂Te₃):
Sb₂Te₃ is a grey crystalline solid with a layered structure—two atomic sheets of antimony and three of tellurium held together by van der Waals forces. It is a well-known thermoelectric material used in power generators, coolers, and thermal sensors, with effective performance from 200 K to 400 K due to its excellent electrical conductivity. These sputtering targets are also suitable for coating flexible materials.
