Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, Elastomer
Purity: 99.99% | Size: 2” | Thickness: 0.125”
Sputtering is a well-established technology for depositing thin films onto a wide variety of materials and substrate shapes. The process using sputter targets is repeatable and scalable, from small research projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters. While sputter deposition is complex, it provides experts with precise control over film growth and microstructure.
Applications of Sputtering Targets:
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Thin-film deposition by transferring material from a “target” source onto a “substrate,” such as a silicon wafer.
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Semiconductor etching when high anisotropy is required and selectivity is not critical.
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Analytical applications, including secondary ion spectroscopy (SIMS), where sputtering enables precise composition analysis and detection of trace impurities.
Sputtering targets also have applications in space. Sputtering contributes to space weathering, altering the physical and chemical properties of airless bodies such as asteroids and the Moon.
Barium strontium titanate (BST) is a solid solution of barium titanate (BaTiO3) and strontium titanate (SrTiO3). Thin films of BST produced via sputtering provide excellent dielectric properties. BST-based ferroelectric thin-film devices have become popular over the last decade in tunable microwave applications, including delay lines, resonators, phase shifters, and varactors.
BST thin films are valued for their high dielectric constant, tunability, and low dielectric loss. Studies on dielectric-tunable properties of BST films have examined factors such as oxygen vacancies, film thickness, grain size, Ba/Sr ratio, doping concentrations, high-temperature annealing, and multilayer structures to achieve improved tunability and lower dielectric loss.
