Barium Strontium Titanate (BaₓSr₁₋ₓTiO₃) Sputtering Targets – Elastomer
Purity: 99.99% Size: 8” Thickness: 0.250”
Barium Strontium Titanate (BST) sputtering targets are high-purity ceramic materials designed for precision thin-film deposition. Sputtering transfers material from the target to various substrates, with chemical reactions occurring on the target surface, in-flight, or on the substrate depending on process parameters. This process is scalable from small research projects to medium and large production batches, allowing precise control over film growth and microstructure.
Applications
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Thin Film Deposition: Uniform coatings on substrates such as silicon wafers.
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Semiconductor Etching: High anisotropy etching where selectivity is not critical.
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Material Analysis (SIMS): Enables trace impurity detection and composition analysis.
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Space Research: Simulates space weathering on airless bodies like asteroids and the Moon.
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Microwave & RF Devices: Tunable dielectric thin films for delay lines, resonators, phase shifters, and varactors.
Material Properties
Barium Strontium Titanate (BST) is a solid solution of BaTiO₃ and SrTiO₃, exhibiting high dielectric constant, tunability, and low dielectric loss. Thin films deposited via sputtering are ideal for ferroelectric devices and tunable microwave applications. BST properties can be tailored by controlling factors such as:
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Ba/Sr ratio
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Oxygen vacancies
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Film thickness and grain size
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Doping concentrations
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High-temperature annealing
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Multilayer structures
These adjustments enable higher tunability and lower dielectric loss for advanced electronic applications.
