Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% | Size: 5” | Thickness: 0.125”
Overview:
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for accurate and consistent thin-film deposition. Sputtering is a widely used film-forming technology that enables uniform coating across a range of substrate shapes and sizes. This process is repeatable and scalable—ideal for both research and development as well as medium- to large-scale production. Depending on the sputtering conditions, chemical interactions may occur on the target surface, during particle travel, or on the substrate, giving experts significant control over film structure and growth.
Applications of Sputtering Targets:
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Thin Film Deposition: Erodes material from the target onto substrates such as silicon wafers, creating uniform thin films.
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Semiconductor Etching: Used in applications requiring high anisotropy where selectivity is not the main priority.
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Material Analysis: Essential in techniques such as Secondary Ion Mass Spectrometry (SIMS), enabling precise composition measurement and detection of trace impurities.
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Space Science Studies: Helps simulate space weathering processes that alter the surfaces of airless bodies like asteroids and the Moon.
Material Properties of BaTiO₃:
Barium Titanate (BaTiO₃) is an inorganic compound appearing as a white powder and becoming transparent when formed into large crystals. It is known for its:
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Ferroelectric behavior
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Photorefractive effect
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Piezoelectric properties
These characteristics make BaTiO₃ films ideal for a wide range of advanced electronic applications.
Common Application Areas:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Assemblies for electronic and optoelectronic devices.
