Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% | Size: 6” | Thickness: 0.125”
Overview:
Barium titanate (BaTiO₃) sputtering targets are high-purity ceramic materials engineered for precise thin film deposition. Sputtering efficiently transfers material from the target onto various substrates, providing precise control over film growth and microstructure. The process is scalable from research and development projects to medium and large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, giving experts full control over the deposition.
Applications:
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Thin Film Deposition: Uniform material deposition on substrates such as silicon wafers.
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Semiconductor Etching: Sputter etching offers high anisotropy where selectivity is less critical.
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Material Analysis: Allows trace impurity detection and composition analysis using secondary ion mass spectrometry (SIMS).
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Space Applications: Simulates space weathering, affecting the physical and chemical properties of airless bodies like asteroids and the Moon.
Material Properties:
Barium titanate is a white inorganic compound, transparent when prepared as large crystals. It is a ferroelectric ceramic with photorefractive and piezoelectric properties, suitable for:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Other electronic device assemblies
Key Features:
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High-purity (99.99%) BaTiO₃ for consistent thin film growth
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Compatible with semiconductor, CVD, and PVD processes
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Supports ferroelectric and piezoelectric applications
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Precise control over microstructure and deposition.
