Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% | Size: 8” | Thickness: 0.250”
Overview:
Barium titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise thin film deposition. Sputtering transfers material from the target onto various substrates, enabling controlled film growth and microstructure. The process is scalable, supporting both research and development and medium to large production batches. Chemical reactions may occur on the target surface, in-flight, or on the substrate, depending on process parameters.
Applications:
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Thin Film Deposition: Ensures uniform material deposition on substrates like silicon wafers.
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Semiconductor Etching: Offers high anisotropy where selectivity is less critical.
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Material Analysis: Allows trace impurity detection and composition analysis using secondary ion mass spectrometry (SIMS).
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Space Applications: Simulates space weathering effects on airless bodies, such as asteroids and the Moon.
Material Properties:
Barium titanate is a white inorganic compound, transparent when prepared as large crystals. It is a ferroelectric ceramic exhibiting photorefractive and piezoelectric properties, suitable for:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Other electronic device assemblies
Key Features:
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High-purity (99.99%) BaTiO₃ for reliable thin film growth
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Compatible with semiconductor, CVD, and PVD processes
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Supports ferroelectric and piezoelectric applications
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Precise control over microstructure and deposition.
