Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 3” Thickness: 0.125”
Overview:
Barium Titanate sputtering targets are designed for precise thin film deposition on diverse substrates. The sputtering process is highly controllable and scalable, making it suitable for both research and industrial production. Chemical reactions may occur on the target surface, in-flight, or on the substrate, providing experts with control over film growth and microstructure.
Applications:
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Thin film deposition for semiconductors, electronic ceramics, and optical devices.
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Etching in semiconductor applications requiring high anisotropy.
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Analytical techniques such as SIMS for target composition analysis and trace impurity detection.
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Space research simulating space weathering on airless celestial bodies.
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Fabrication of ferroelectric, piezoelectric, and photorefractive devices.
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Production of electronic components including detectors, capacitors, and sensors.
Material Properties:
Barium Titanate (BaTiO₃) is a ferroelectric ceramic with piezoelectric and photorefractive properties. It appears as a white powder and is transparent when prepared as large crystals. It is widely used in electronic ceramics, thin-film devices, and advanced sensor applications, offering excellent performance and reliability.
