Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 1” Thickness: 0.250”
Overview:
Barium Zirconate sputtering targets enable precise thin film deposition on a variety of substrates. The sputtering process is highly controllable, repeatable, and scalable from small-scale research to medium and large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, providing experts with precise control over film growth and microstructure.
Applications:
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Thin film deposition on substrates such as silicon wafers.
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Semiconductor etching with high anisotropy requirements.
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Analytical applications including SIMS for composition analysis and trace impurity detection.
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Space research, simulating space weathering on airless bodies like asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is a high-purity electroceramic material valued for its stable electrical properties and compatibility with advanced deposition techniques. Its use in PVD and CVD processes ensures consistent and high-quality thin films suitable for electronic, optical, and ferroelectric applications.
