Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 2” Thickness: 0.125”
Overview:
Barium Zirconate sputtering targets provide reliable thin film deposition across diverse substrates. The sputtering process is highly controllable, repeatable, and scalable from research projects to medium-to-large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate, offering precise control over film growth and microstructure.
Applications:
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Thin film deposition on substrates like silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Analytical applications such as SIMS for composition and trace impurity detection.
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Space research, including studies on asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is an electroceramic material valued for its excellent electrical properties and chemical stability. Its high purity ensures consistent performance in advanced electronic, optical, and ferroelectric applications, compatible with both PVD and CVD deposition methods.
