Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.9% Size: 2” Thickness: 0.250”
Overview:
Barium Zirconate sputtering targets are engineered for consistent thin film deposition across a variety of substrates. The sputtering process is repeatable and scalable, suitable for both research and medium-to-large production batches. Depending on process parameters, chemical reactions can occur on the target surface, in-flight, or on the substrate, giving precise control over film growth and microstructure.
Applications:
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Thin film deposition on substrates such as silicon wafers.
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Semiconductor etching where high anisotropy is required.
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Analytical processes like SIMS for composition and trace impurity detection.
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Space research applications, including studies on asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is an electroceramic with excellent electrical properties and chemical stability. Its high purity ensures reliable performance for advanced electronic, optical, and ferroelectric applications, compatible with both PVD and CVD deposition techniques.
