Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 4” Thickness: 0.250”
Overview:
Barium Zirconate sputtering targets are designed for high-quality thin film deposition on a wide range of substrate shapes and sizes. The sputtering process is repeatable and scalable, supporting both small R&D projects and medium to large production batches. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters, giving precise control over film growth and microstructure.
Applications:
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Thin film deposition on substrates such as silicon wafers.
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Semiconductor etching where high anisotropy is needed.
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Analytical applications like SIMS for composition and impurity analysis.
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Space research, simulating space weathering on airless bodies like asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric applications requiring high-performance materials.
Material Properties:
Barium Zirconate (BaZrO₃) is an electroceramic material prized for its excellent electrical properties. It is chemically stable, suitable for high-precision thin films, and compatible with a variety of deposition techniques including PVD and CVD. Its high purity ensures consistent performance in advanced electronic and optical applications.
