Bismuth Ferrite (BiFeO3) Sputtering Targets, Indium
Purity: 99.9% Size: 3” Thickness: 0.250”
Sputtering is a reliable method for depositing thin films from diverse materials onto substrates of various shapes and sizes. The process is repeatable and scalable, suitable for both research projects and medium-to-large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, offering precise control over film growth and microstructure.
Applications of Sputtering Targets
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Thin Film Deposition: Transfers material from the target onto substrates like silicon wafers.
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Semiconductor Etching: Ideal for high-anisotropy etching when selectivity is not critical.
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Analytical Uses: Enables compositional analysis and detection of trace impurities, as in Secondary Ion Mass Spectroscopy (SIMS).
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Space Applications: Plays a role in space weathering, affecting the physical and chemical properties of airless bodies such as asteroids and the Moon.
About Bismuth Ferrite (BiFeO3)
Bismuth ferrite (BiFeO3) is an inorganic perovskite-structured compound and a leading multiferroic material. Targets are typically produced via high-temperature sintering or recrystallization of Bi and Fe oxide compounds to achieve a single-phase BiFeO3. Indium bonding is recommended for optimal target performance.
This Pb-free ferroelectric material exhibits outstanding ferroelectric properties, including large remnant polarization, high Curie temperature, and high antiferromagnetic Néel temperature. It uniquely combines magnetic and ferroelectric properties at and above room temperature. Its strong polarization-induced photovoltaic response and 3.3 eV direct band gap make BiFeO3 films highly suitable for advanced ferroelectric photovoltaic studies.
