Boron (B) Sputtering Targets, indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”

$848.83

Boron (B) Sputtering Targets, Indium

Purity: 99.9% Size: 3” Thickness: 0.125”

Sputtering is a well-established method for depositing thin films from diverse materials onto substrates of various shapes and sizes. The process using sputter targets is repeatable and scalable, suitable for both small-scale R&D and larger production batches. Depending on process parameters, chemical reactions may occur on the target surface, in-flight, or on the substrate. While the process involves many variables, it gives experts precise control over film growth and microstructure.

Applications of Sputtering Targets

  • Thin Film Deposition: Erodes material from a “target” onto substrates such as silicon wafers.

  • Semiconductor Etching: Sputter etching is applied when high etching anisotropy is needed without concern for selectivity.

  • Analytical Methods: Used in secondary ion mass spectrometry (SIMS) to measure sputtered atoms, determine target composition, and detect trace impurities.

  • Space Applications: Sputtering naturally occurs in space weathering, altering the physical and chemical properties of airless bodies like asteroids and the Moon.

Boron Nitride Overview

Boron nitride (BN) is a heat- and chemically-resistant compound of boron and nitrogen. It exists in multiple crystalline forms:

  • Hexagonal BN (h-BN): Soft, low-friction, lubricating, electrically insulating, and thermally conductive. Used in high-temperature metal forming dies, metal processing, and as cosmetic additives.

  • Cubic BN (c-BN): Diamond-like structure, slightly softer than diamond but with superior thermal and chemical stability. Commonly used in high-temperature equipment and cutting tool coatings.

Properties and Coating Applications

Cubic boron nitride (c-BN) features:

  • High hardness

  • Low friction coefficient

  • Excellent thermal conductivity

  • High electrical resistivity

  • Superior wear resistance

  • Chemical inertness at high temperatures

It is the hardest material after diamond and surpasses diamond in chemical stability against oxygen and ferrous metals at elevated temperatures.

Polymorphs and Applications:

  • h-BN: Soft, lubricating, thermally conductive; widely used in high-temperature metal forming and solid lubricants.

  • c-BN: Hard, chemically inert, ideal for cutting tools; used in dry cutting, high-speed machining, and processing hard materials.

Sintered c-BN tools are effective but costly, brittle, and difficult to shape.

For larger inquiries, please contact us.

Download ……………………….. MSDS

Size: 1 piece

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