Chromium Oxide (Cr₂O₃) Sputtering Targets — Specifications
| Property | Details |
|---|---|
| Material | Chromium Oxide (Cr₂O₃) |
| Purity | 99.8%–99.9% |
| Size | 4” |
| Thickness | 0.250” |
General Description
| Topic | Details |
|---|---|
| Sputtering Process | Sputtering is a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes. |
| Scalability | The process with sputter targets is repeatable and can be scaled up from small research and development projects. |
| Adaptability | The process with sputter targets can be adapted to production batches involving medium to large substrate areas. |
| Reaction Behavior | The chemical reaction can occur on the target surface, in-flight, or on the substrate depending on the process parameters. |
| Process Complexity | The many parameters make sputter deposition a complex process but allow experts significant control over growth and microstructure. |
Applications of Sputtering Targets
| Application | Explanation |
|---|---|
| Film Deposition | Used for depositing thin films by sputtering, involving eroding material from a “target” onto a “substrate” such as a silicon wafer. |
| Semiconductor Etching | Used to etch the target when high etching anisotropy is required and selectivity is not a concern. |
| Analytical Use | Applied in material analysis by etching away the target material. |
| SIMS Example | In secondary ion mass spectroscopy (SIMS), the target is sputtered at a constant rate. The sputtered atoms’ identity and concentration are measured using mass spectrometry to determine material composition and detect extremely low impurity levels. |
| Space Applications | Sputtering contributes to space weathering, altering physical and chemical properties of airless bodies such as asteroids and the Moon. |
Chromium Oxide–Specific Notes
| Topic | Details |
|---|---|
| Material Description | Chromium oxide is the inorganic compound with the formula Cr₂O₃. Chromium oxide sputtering targets are used in many applications. |
| Hardness & Friction | Cr₂O₃ thin films exhibit high hardness and low friction coefficients, making them candidates to replace transition metal nitrides or Al₂O₃ in special applications. |
| Optical & Electrical Uses | Thin films of chromium oxide are essential for integrated circuits, flat panel displays, and various optical devices. |
| Magnetic Recording | Hard coatings are used in magnetic heads and media for corrosion and wear protection. Chromium oxide coatings have been developed to protect the tape-bearing surface of digital compact cassette (DCC) heads. |
