Cerium Oxide (CeO₂) Sputtering Targets, 1” × 0.250”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO₂) Sputtering Targets |
| Purity | 99.99% |
| Size | 1” |
| Thickness | 0.250” |
| Description | Sputtering deposits thin films on diverse substrates. The process is repeatable, scalable from R&D to medium/large-area production, and allows precise control over microstructure. Reactions can occur on the target, in-flight, or on the substrate depending on process parameters. |
| Applications of Sputtering Targets | – Thin-film deposition on substrates like silicon wafers – Semiconductor sputter-etching requiring high anisotropy – Analytical etching (e.g., SIMS) to detect trace impurities – Space applications, studying weathering on airless bodies such as asteroids and the Moon |
| Material Information (Cerium Oxide) | Cerium oxide, a lanthanide and the most abundant rare-earth element, has high refractive index and dielectric constant. It is widely used in polishing, automotive catalysts, gas sensors, electrolytes, oxygen storage, oxide fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices, and as a corrosion-protective coating alternative to chromates. |
