Cerium Oxide (CeO₂) Sputtering Targets, 3” × 0.125”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO₂) Sputtering Targets |
| Purity | 99.99% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering enables precise thin-film deposition on diverse substrates. The process is repeatable, scalable from R&D to medium/large-area production, and allows control over film microstructure. Reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters. |
| Applications of Sputtering Targets | – Thin-film deposition on substrates like silicon wafers – Semiconductor sputter-etching for high anisotropy – Analytical etching for SIMS to detect low-concentration impurities – Space applications studying weathering on airless bodies (Moon, asteroids) |
| Material Information (Cerium Oxide) | Cerium oxide, the most abundant lanthanide, has a high refractive index and dielectric constant. It is used for corrosion-resistant coatings, polishing, automotive catalysts, gas sensors, electrolyte materials, oxygen storage, oxide fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices due to its moderate band gap and stability. |
