Cerium Oxide (CeO2) Sputtering Targets, 7” × 0.250”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO2) Sputtering Targets |
| Purity | 99.99% |
| Size | 7” |
| Thickness | 0.250” |
| Description | Sputtering is a proven method for depositing thin films from various materials onto diverse substrate shapes. The process is repeatable, scalable from small R&D to medium/large substrate production, and allows precise control over film growth and microstructure. Reactions can occur on the target, in-flight, or on the substrate depending on parameters. |
| Applications | – Thin film deposition on substrates (e.g., silicon wafers) – Semiconductor etching with high anisotropy – Material analysis via SIMS – Space applications (space weathering on asteroids, Moon) |
| Material Info | Cerium, a lanthanide and the most abundant rare-earth element in Earth’s crust, forms CeO2. Cerium oxide is widely used for optical and electronic applications due to high refractive index and dielectric constant. Additional uses include corrosion-protective coatings, polishing materials, automotive catalysts, gas sensors, electrolytes, oxygen storage, oxide fuel cells, and microelectronics, optical, electro-optical, and optoelectronic devices. |
