Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target (3” × 0.125”) information in table format:
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target, Indium |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering is a reliable technology for depositing thin films from various materials onto diverse substrates. It allows precise control over growth and microstructure and is scalable from small R&D to medium-large production batches. |
| Key Features | • Repeatable and scalable process • High control over deposition and microstructure • Compatible with various substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor etching with high anisotropy • Analytical sputtering (SIMS) for material composition and impurity detection • Space applications, including simulation of space weathering on airless bodies like asteroids and the Moon |
