| Category | Details |
|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Proven technology for depositing thin films from various materials onto diverse substrate shapes. Scalable from small R&D to medium-large production. Allows precise control over target reactions, in-flight deposition, and substrate microstructure. |
| Key Features | • Repeatable, scalable process • High control over microstructure • Adaptable to medium-large substrate areas |
| Applications | • Thin-film deposition on substrates (e.g., silicon wafers) • Semiconductor etching (high anisotropy) • Analytical sputtering (SIMS) for composition and trace impurities • Space weathering studies on airless bodies (asteroids, Moon). |
