Ytterbium Oxide (Yb₂O₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Ytterbium Oxide (Yb₂O₃) Sputtering Targets |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering is a proven method for depositing thin films onto various substrate shapes and sizes. The process is repeatable, scalable, and adaptable from small R&D tasks to large production batches. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters, providing high control over film growth and microstructure. |
Applications
| Application Area | Explanation |
|---|---|
| Thin Film Deposition | Used to deposit thin films by eroding target material and transferring it onto substrates such as silicon wafers. |
| Semiconductor Etching | Used for sputter etching when high anisotropy is required and selectivity is less important. |
| Material Analysis (SIMS) | Target is sputtered at a constant rate for mass spectrometry measurements to identify composition and detect trace impurities. |
| Space Science / Space Weathering | Sputtering contributes to physical and chemical changes on airless planetary bodies such as the Moon and asteroids. |
