Product Table
| Property | Specification |
|---|---|
| Material | Yttrium Ferrite (Y₃Fe₅O₁₂) |
| Purity | 99.9% |
| Size | 2” |
| Thickness | 0.125” |
| Form | Sputtering Target |
Description
Yttrium Ferrite (Y₃Fe₅O₁₂) sputtering targets are used for precise thin-film deposition across various substrates. The sputtering process is scalable from small R&D applications to medium and large production batches. Chemical reactions can occur on the target surface, during particle travel, or at the substrate depending on process conditions, providing high control over film microstructure and quality.
Applications
-
Thin-film deposition onto substrates such as silicon wafers
-
Semiconductor sputter etching where high anisotropy is required
-
Surface analysis via SIMS (Secondary Ion Mass Spectrometry)
-
Space-science applications, where sputtering contributes to space weathering of bodies like the Moon and asteroids.
